Psi-Da.com
Title
PSIDA Lithography & Software LLC. EDA Asynchronous design and photolithography simulation software and intellectual property supplier to the semiconductor industry.
Description
Excerpted from the website description:
- PSIDA Lithography & Software provides an accurate, extremely fast,advanced analysis of semiconductor electronic designs through the photo lithography and etch processes done on silicon, gallium arsenide or germanium wafers. The computational methods utilize Hopkin's formula on 2D (dimensions) large area masks while 3D (dimensional) reticles are calculated using complete curl E and Curl H solvers. True semiconductor fabrication yield issues such as scanner or stepper chromatic, scalar or other aberrations are addressed quickly by the ODRC, optical design rule checker or RDRC code inside PSIDA. Litho-friendly optimized manufacturing capabilities for large chips or die on flat or non-planar topography is achieved utilizing Psi-da intellectual property, IP. Research and development reduced cycle time to market is obtained by rigorous simulation through resist at multiple focus and exposure dose conditions. The closed-loop solution of Maxwell's equation in the latent image guarantees excellent product statistical variation reduction through an extensive vectorial verification. The numerical aperture settings or hyper-NA, illuminator type, mask (AAPSM, Chromeless, Binary, Attenuated, half-tone or tri-tone) desired for best probability of good bin results versus cost and profitability is easily determined.
Additional Information
External Links
- Alexa: Psi-Da.com
- WHOIS for Psi-Da.com
Categories:
- AAPSM
- Alternating Aperture
- Asynchronous Design
- Behavioural Synthesis
- CAD Editor
- CPL
- Chromeless Phase-shift
- Copper
- DEF
- DFM
- Damascene
- Defects
- Design For Manufacturing
- EDA
- EMF
- Electromagnetic Field
- Electronic Design Automation
- Etch
- FE
- Focus Exposure Matrix
- GDSII
- Immersion
- LEF
- Laser Confocal
- Laser Confocal Review
- Litho
- Litho Hotspots
- Lithography
- Lithography Simulation
- Management
- Mask
- ODRC
- OPC
- Optical Design Rule Checker
- Optical Proximity Correction
- PSM
- Phase-shift Mask
- Photo Area
- Photolithography
- Photolithography Simulation
- Photomask
- Photoresist
- Psida
- RET
- Resist Design Rule Checker
- Resist Simulation
- Reticle Enhancement Technology
- Reticle Inspection
- Semiconductor Measurement
- Shrinks
- Simulation
- Spectroscopic Ellipsometry
- Sub-wavelength
- Submicron
- Synchronous Design
- Wafer Defects
- Wafer Fabrication
- Wafer Inspection
- Yellow Room
- Yield